Fabrication-Low Temperature Carbon Nanotube Vertical Interconnects-Preview

Press/Media: Public Engagement

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Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology - a 2 minute Preview of the Experimental Protocol Sten Vollebregt, Ryoichi Ishihara Delft University of Technology, Department of Microelectronics; A method for the growth of low temperature vertically-aligned carbon nanotubes, and the subsequent fabrication of vertical interconnect electrical test structures using semiconductor fabrication is presented.

Period26 May 2022

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Media contributions

  • TitleFabrication-Low Temperature Carbon Nanotube Vertical Interconnects
    Country/TerritoryNetherlands
    Date26/05/22
    DescriptionA method for the growth of low temperature vertically-aligned carbon nanotubes, and the subsequent fabrication of vertical interconnect electrical test structures using semiconductor fabrication is presented.
    Producer/AuthorJoVE
    URLhttps://www.youtube.com/watch?v=W3JPqt3t-so
    PersonsR. Ishihara, S. Vollebregt
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