ImPhys/Microscopy Instrumentation & Techniques

Research output

Research output per year 1988 1996 1997 1998 1999 2000 2001 2002 2008 2009 2019 2023

• 350 Article
• 142 Conference contribution
• 118 Patent
• 110 Report
• 102 More
  • 40 Dissertation (TU Delft)
  • 22 Chapter
  • 12 Abstract
  • 8 Conference article
  • 5 Review article
  • 4 Book
  • 3 Editorial
  • 2 Dissertation (external)
  • 1 Book editing
  • 1 Entry for encyclopedia/dictionary
  • 1 Poster
  • 1 Comment/Letter to the editor
  • 1 Letter
  • 1 Dissertation (external, preparation TU Delft)

Research output per year

Research output per year

Search results

• 2023

  Method for inspecting a specimen and charged particle beam device

  Cook, B. J., Kruit, P., Schmidt, R. R., Naftali, R., Barday, R., Winkler, D. & Frosien, J., 2023, IPC No. H01J, Patent No. TWI790489, Priority date 21 Oct 2019

  Research output: Patent
• 2022

  Method for positioning a focal plane of a light imaging device and apparatus arranged for applying said method

  Kruit, P., Hoogenboom, J. P., Liv Hamarat, N. & Narvaez Gonzalez, A. C., 2022, IPC No. G02B, H01J, Patent No. EP 3146374 B1, Priority date 26 Nov 2015

  Research output: Patent
• 2021

  Apparatus and method for manipulating thin film sections or ribbons of thin film sections

  Hoogenboom, J. P., Carroll, E. C. M. & Pang, N. Y., 2021, IPC No. G01N, Priority date 20 Sept 2022, Priority No. NL2027636

  Research output: Patent

• Device for generating a plurality of charged particle beamlets, and an inspection, imaging or processing apparatus and method for using the same

  Kruit, P., 2021, IPC No. H01J, Priority date 8 Oct 2019, Priority No. TW202115761

  Research output: Patent

• Method for inspecting a specimen and charged particle beam device

  Cook, B. J., Kruit, P., Schmidt, R. R., Naftali, R., Barday, R., Winkler, D. & Frosien, J., 2021, IPC No. H01J, Priority date 21 Oct 2019, Priority No. WO 2021/078352

  Research output: Patent

• Method for integrated acquisition and registration of large-scale microscopy image data

  Hoogenboom, J. P., Srinivasa Raja, A., den Hoedt, S. V. & Lane, R., 2021, Priority date 7 Feb 2020, Priority No. WO2021/158111

  Research output: Patent

• Methods for designing and fabricating a pupil intensity mask

  Carroll, E. C. M. & Ceffa, N. G., 2021, IPC No. G02B, G03F, G01N, Priority date 15 May 2020, Priority No. WO2021/230745

  Research output: Patent

• Multi-beam charged particle source with alignment means

  Kruit, P., 2021, IPC No. H01J, Priority date 21 Oct 2019, Priority No. WO2021/080420

  Research output: Patent
• 2020

  Beam deflection device, aberration corrector, monochromator, and charged particle beam device

  Kruit, P., 2020, IPC No. Ho1J37/147, Ho1j37/05, Ho1J37/153, Priority date 31 May 2019, Priority No. WO2020240861

  Research output: Patent

• Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets

  Kruit, P., Mohammadi Gheidari, A. & Kieft, E. R., 2020, IPC No. H01J, G21K, Priority date 27 Feb 2019, Priority No. US 2020273667 A1

  Research output: Patent

• Integrated optical and charged particle inspection apparatus

  Hoogenboom, J. P. & den Hoedt, S., 2020, IPC No. H01J, Priority date 18 Mar 2019, Priority No. WO 2020190136 A1

  Research output: Patent

• Method for inspecting a sample in a charged particle microscope

  Hoogenboom, J. P. & Zuidema, W., 2020, IPC No. H01J, Priority date 18 Mar 2019, Priority No. NL2022755

  Research output: Patent
• 2019

  Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column

  Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO 2019/164392

  Research output: Patent

• Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column

  Kruit, P. & Naftali, R., 2019, IPC No. H01J, Patent No. US 10,395,887, Priority date 20 Feb 2018

  Research output: Patent

• Multi electron beam inspection apparatus

  Kruit, P., 2019, IPC No. H01J, Patent No. CNZL201580057918.2, Priority date 4 Sept 2014

  Research output: Patent

• Signal separator for a multi-beam charged particle inspection apparatus

  Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO2019/164391

  Research output: Patent

• Signal separator for a multi-beam charged particle inspection apparatus

  Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO2019/164391

  Research output: Patent

• Signal separator for Multi electron beam inspection apparatus

  Kruit, P. & Naftali, R., 2019, IPC No. H01J, Patent No. US 10,504,687, Priority date 20 Feb 2018

  Research output: Patent
• 2018

  Aberration correcting device for an electron microscope and an electron microscope comprising such a device

  Kruit, P., 2018, IPC No. H01J, Priority date 22 Jul 2016, Priority No. WO 2018016961 A1

  Research output: Patent

• Method and apparatus for determining a density of fluorescent markers in a sample

  Kruit, P., 2018, IPC No. H01J, G01N, Patent No. US 10132753 B2

  Research output: Patent

• Method for inspecting a specimen and charged particle multi-beam device

  Kruit, P. & Frosien, J., 2018, IPC No. H01J, Priority date 1 Dec 2016, Priority No. WO 2018/099756

  Research output: Patent

• Method for inspecting a specimen and charged particle multi-beam device

  Kruit, P. & Frosien, J., 2018, IPC No. H01J, Patent No. US 9,922,796, Priority date 1 Dec 2016

  Research output: Patent
• 2017

  Apparatus and method for irradiating a surface of a sample using charged particle beams

  Kruit, P., Scotuzzi, M. & Hagen, C. W., 2017, IPC No. H01J, Priority date 30 May 2016, Priority No. NL 2016853

  Research output: Patent

• Method for aligning a pinhole for confocal cathodoluminescence

  Narvaez Gonzalez, A., Hoogenboom, J. & Weppelman, G., 2017, IPC No. H01J, Priority date 20 Jul 2015, Priority No. WO 2017/014626

  Research output: Patent
• 2016

  Multi electron beam inspection apparatus

  Kruit, P., 2016, IPC No. H01J, Priority date 4 Sept 2014, Priority No. WO2016/036246

  Research output: Patent
• 2015

  Arrangement and method for transporting radicals

  Kruit, P., 2015, IPC No. B08B; H05H; H01L; B82Y; G03F; H01J; F15D, Patent No. US 9123507 B2, Priority date 20 Mar 2012

  Research output: Patent

• Lithography system and projection method

  Kruit, P., Jager, R., Steenbrink, S. W. H. K. & Wieland, MJJ., 2015, IPC No. Aanvrager: Mapper Lithography B.V., Patent No. USRE45552, Priority date 9 Jun 2015

  Research output: Patent

• Method and apparatus for determining a density of fluorescent markers in a sample

  Kruit, P., 2015, IPC No. H01J, G01N, Priority No. NL 2012218 C2

  Research output: Patent

• Method for determining local concentration of markers in a sample

  Kruit, P. & Hoogenboom, JP., 2015, IPC No. OCT-12-042Applicant: DELMIC B.V;, Patent No. NL 2012218 C, Priority date 10 Aug 2015

  Research output: Patent

• Parallel transmission electron detector for multi-beam scanning electron microscope

  Zonnevylle, AC., Kruit, P. & Ren, Y., 2015, IPC No. OCT-14-003, Patent No. WO 2015/170969, Priority date 12 Nov 2015

  Research output: Patent
• 2014

  Apparatus and method for inspecting a surface of a sample

  Kruit, P., 2014, IPC No. OCT-12-048, Patent No. 2009696, Priority date 29 Apr 2014

  Research output: Patent

• Confocal cathodoluminescence microscope

  Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2014, IPC No. OCT-10-006Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. US 8895921 B2, Priority date 25 Nov 2014

  Research output: Patent

• Method for positioning a focal plane of a light imaging device and apparatus arranged for applying said method

  Kruit, P., Hoogenboom, J. P., Liv Hamarat, N. & Narvaez Gonzalez, A. C., 2014, IPC No. G02B, H01J, Priority date 26 Nov 2015, Priority No. WO 2015178774 A1

  Research output: Patent

• Passieve compensatie van magne

  Kruit, P., Overbeeke, F. & Gravendeel, B., 2014, IPC No. OCT-07-014, Patent No. 2017118, Priority date 14 May 2014

  Research output: Patent
• 2013

  Charged particle lithography system with aperture array cooling

  Kruit, P. & van Veen, A. H., 2013, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Patent No. US 8558196 B2, Priority date 26 Oct 2010

  Research output: Patent

• Lithography system, method of clamping an wafer table

  Kruit, P., de Boer, G. & Dansberg, MP., 2013, IPC No. Applicant: G de Boer, Mapper Lithography IP BV, MP Dansberg, P Kruit, Patent No. CN 101884016 B, Priority date 9 Oct 2013

  Research output: Patent
• 2012

  Confocal cathodoluminescence microscope

  Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2012, IPC No. Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. NL 2005080 C, Priority date 17 Jan 2012

  Research output: Patent

• Lithography system, method of heat dissipation and frame

  Kruit, P., Dansberg, MP. & Wieland, MJJ., 2012, IPC No. Applicant: Mapper Lithography IP BV, Patent No. US 8325321 B2, Priority date 4 Dec 2012

  Research output: Patent

• Modulation device and charged particle multi-beamlet lithography system using the same

  Kruit, P. & van Veen, A. H., 2012, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Priority date 26 Oct 2010, Priority No. WO 2012055938 A1

  Research output: Patent

• Multiple beam charged particle optical system

  van Bruggen, MJ. & Kruit, P., 2012, Patent No. US 8134135 B2, Priority date 13 Mar 2012

  Research output: Patent

• Multiple beam charged particle optical system

  Kruit, P. & Zonnevylle, AC., 2012, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. US 8294117 B2, Priority date 23 Oct 2012

  Research output: Patent
• 2011

  Charged particle beam exposure system

  Kruit, P., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868307, Priority date 11 Jan 2011

  Research output: Patent

• Charged particle beamlet exposure system

  Kruit, P., 2011, IPC No. aanvrager: MAPPER Lithography B.V., Patent No. EP1830384, Priority date 14 Sept 2011

  Research output: Patent

• Charged particle multi-beamlet apparatus

  Kruit, P. & Zonnevylle, CA., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US61/491865, Priority date 31 May 2011

  Research output: Patent

• Lithography system, sensor and measuring method

  Kruit, P., Slot, E., Teepen, TF., Wieland, MJJ. & Steenbrink, SWHK., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868300B2, Priority date 11 Jan 2011

  Research output: Patent

• Multiple beam charged particle optical system

  Kruit, P. & Zonnevylle, AC., 2011, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. WO 2010050603 A1, Priority date 24 Mar 2011

  Research output: Patent

• Projection lens arrangement

  Wieland, JJ., Kampherbeek, BJ., van Veen, AHV., Kruit, P. & Steenbrink, SWHK., 2011, IPC No. H01L, B82Y, H01J, G03F, G01J, G21K, Patent No. EP 2279515 B1, Priority date 28 Feb 2008

  Research output: Patent
• 2010

  Lithography system

  Wieland, MJJ., van 't Spijker, JC., Jager, R. & Kruit, P., 2010, IPC No. Aanvrager: x, Patent No. US2010045958 A1, Priority date 25 Feb 2010

  Research output: Patent

• Lithography system and projection method

  Kruit, P., Wieland, MJJ., Steenbrink, S. & Jager, R., 2010, IPC No. Verleend. Aanvrager: Mapper Lithography, Patent No. US7842936 B2, Priority date 30 Nov 2010

  Research output: Patent

• Lithography system comprising dispenser cathode

  Kruit, P. & Steenbrink, S., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. EP2267747 A1, Priority date 29 Dec 2010

  Research output: Patent