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  • 2016

    Resist assisted patterning

    Kalhor, N. & Alkemade, P. F. A., 2016, Helium Ion Microscopy (NanoScience and Technology). Hlawacek, G. & Gölzhäuser, A. (eds.). Springer, p. 395-414 20 p. (NanoScience and Technology).

    Research output: Chapter in Book/Conference proceedings/Edited volumeChapterScientificpeer-review

    5 Citations (Scopus)