J.M. Kuiper

Search results

• 2010

  Inspection apparatus for lithography

  Kuiper, JM., 2010, IPC No. aangevraagd door ASML NL, Veldhoven (NL), Patent No. US 2010/0302521 A1, Priority date 2 Dec 2010

  Research output: Patent

• Inspection method and apparatus, and lithographic apparatus

  Kuiper, JM., 2010, Patent No. WO 2010/020506 A1, Priority date 25 Feb 2010

  Research output: Patent

• Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus

  Kok, HV., Kivits, K., van de Laak, R., Kuiper, JM., van der Zouw, G. & Tolsma, HPT., 2010, IPC No. aangevraagd door ASML NL, Veldhoven (NL), Patent No. US7,773,235 B2, Priority date 10 Aug 2010

  Research output: Patent

• Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

  van de Kerkhof, MA., de Boeij, WP., van Greevenbroek, HRM., Klaassen, MFH., Kok, HV., Wehrens, MGD., Uitterdijk, T., Rooijakkers, WJM., Kuiper, JM., van Dooren, L., Sonneveld, J. & Giling, EJM., 2010, IPC No. aangevraagd door ASML NL, Veldhoven (NL), Patent No. US 2010/0182582 A1, Priority date 22 Jul 2010

  Research output: Patent