M.J. Kamerbeek - Research output - TU Delft Research Portal

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2015

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition
Scotuzzi, M., Kamerbeek, MJ., Goodyear, A., Cooke, M. & Hagen, CW., 2015, Alternative Lithographic Technologies VII. Resnick, DJ. & Bencher, C. (eds.). Bellingham, WA, USA: SPIE, p. 1-12 12 p. (Proceedings of SPIE- International Society for Optical Engineering; vol. 9423).
Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

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3 Citations (Scopus)