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Research Output

2014

A large current scanning electron microscope with MEMS-based multi-beam optics

Ichimura, T., Ren, Y. & Kruit, P., 2014, In : Microelectronic Engineering. 113, p. 109-113 5 p.

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)

Apparatus and method for inspecting a surface of a sample

Kruit, P., 2014, IPC No. OCT-12-048, Patent No. 2009696, Priority date 29 Apr 2014

Research output: Patent

Confocal cathodoluminescence microscope

Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2014, IPC No. OCT-10-006Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. US 8895921 B2, Priority date 25 Nov 2014

Research output: Patent

Confocal filtering in cathodoluminescence microscopy of nanostructures

Narvaez Gonzalez, AC., Weppelman, IGC., Moerland, RJ., Hoogenboom, JP. & Kruit, P., 2014, In : Applied Physics Letters. 104, 251121 (2014), p. 1-5 5 p.

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)

Determination of line edge roughness in low-dose top-down scanning electron microscopy images

Verduin, T., Kruit, P. & Hagen, CW., 2014, In : Journal of Micro/Nanolithography, MEMS, and MOEMS. 13, 3, p. 1-10 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Determination of line edge roughness in low-dose top-down scanning electron microscopy images

Verduin, T., Kruit, P. & Hagen, CW., 2014, In : Proceedings of SPIE- International Society for Optical Engineering. 9050, p. 1-3 3 p.

Research output: Contribution to journalConference articleScientificpeer-review

Multi-electron-beam deflector array

Zonnevylle, AC., Heerkens, CTH., Hagen, CW. & Kruit, P., 2014, In : Microelectronic Engineering. 123, p. 140-148 9 p.

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Multi-electron-beam nanoelectronics

Kruit, P., 2014, Technical Digest - 2014 27th International Vacuum Nanoelectronics Conference, IVNC 2014. nb (ed.). nb: IEEE Society, p. 220-221 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Passieve compensatie van magne

Kruit, P., Overbeeke, F. & Gravendeel, B., 2014, IPC No. OCT-07-014, Patent No. 2017118, Priority date 14 May 2014

Research output: Patent

Scanning electron microscopy of individual nanoparticle bio-markers in liquid

Liv Hamarat, N., Lazic, I., Kruit, P. & Hoogenboom, JP., 2014, In : Ultramicroscopy. 143, p. 93-99 7 p.

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Semitransparency in interaction-free measurements

Thomas, S., Kohstall, C., Kruit, P. & Hommelhoff, P., 2014, In : Physical Review A (Atomic, Molecular and Optical Physics). 90, 5, p. 0538401-05384010 10 p.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

Hari, S., Hagen, CW., Verduin, T. & Kruit, P., 2014, Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490M. Resnick, D. J. & Bencher, C. (eds.). s.n.: SPIE, p. 1-4 4 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Size and Shape Control of Sub-20 nm Patterns Fabricated Using Focused Electron Beam Induced Processing

Hari, S., Hagen, CW., Verduin, T. & Kruit, P., 2014, In : Journal of Micro/Nanolithography, MEMS, and MOEMS. 13, 3, p. 1-7 7 p.

Research output: Contribution to journalArticleScientificpeer-review

2013

A large current scanning electron microscope with MEMS-based multi-beam optics

Ichimura, T., Ren, Y. & Kruit, P., 2013, In : Microelectronic Engineering. 113, p. 109-113 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
8 Citations (Scopus)

Cathodoluminescence Microscopy of nanostructures on glass substrates

Narvaez, AC., Weppelman, IGC., Moerland, RJ., Liv, N., Zonnevylle, AC., Kruit, P. & Hoogenboom, JP., 2013, In : Optics Express. 21, 24, p. 29968-29978 11 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
9 Citations (Scopus)
Open Access
3 Citations (Scopus)

Energy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas Chamber

Jun, DS. & Kruit, P., 2013, p. 1-2. 2 p.

Research output: Contribution to conferenceAbstractScientific

Integration of a high-NA light microscope in a scanning electron microscope

Zonnevylle, AC., van Tol, RFC., Liv, N., Narvaez, AC., Effting, APJ., Kruit, P. & Hoogenboom, JP., 2013, In : Journal of Microscopy. 252, 1, p. 58-70 13 p.

Research output: Contribution to journalArticleScientificpeer-review

38 Citations (Scopus)

Lithography system, method of clamping an wafer table

Kruit, P., de Boer, G. & Dansberg, MP., 2013, IPC No. Applicant: G de Boer, Mapper Lithography IP BV, MP Dansberg, P Kruit, Patent No. CN 101884016 B, Priority date 9 Oct 2013

Research output: Patent

Scanning electron microscopy of individual nanoparticle bio-markers in liquid

Liv, N., Lazic, I., Kruit, P. & Hoogenboom, JP., 2013, In : Ultramicroscopy. p. 1-7 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
9 Citations (Scopus)

Simultaneous Correlative Scanning Electron and High-NA Fluorescence Microscopy

Liv, N., Zonnevylle, AC., Narvaez Gonzalez, AC., Effting, APJ., Voorneveld, PW., Lucas, MS., Hardwick, JC., Wepf, RA., Kruit, P. & Hoogenboom, JP., 2013, In : PLoS ONE. 8, 2, p. 1-10 10 p.

Research output: Contribution to journalArticleScientificpeer-review

54 Citations (Scopus)

Two microscopes integrated in one : simultaneous correlative light and electron microscopy

Hoogenboom, JP., Zonnevylle, AC., Liv, N. & Kruit, P., 2013, In : Imaging & Microscopy. 15, 2, p. 30-32 3 p.

Research output: Contribution to journalArticleProfessional

2012

A large current scanning electron microscope with MEMS-based mutli-beam optics

Ichimura, T., Ren, Y. & Kruit, P., 2012, Proc. 38th International Conference on Micro & Nano Engineering. s.n. (ed.). s.n.: s.n., p. 1-4 4 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

26 Citations (Scopus)

Brightness and energy spread measurements for an I-cathode

van Kouwen, L., van der Heijden, M. & Kruit, P., 2012, 2012 IEEE 9th International Vacuum Electron Sources Conference, IVESC 2012 , art. no. 6264197 , pp. 463-464. s.n. (ed.). s.n.: IEEE Society, p. 463-464 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Compensation of High-Frequency Disturbances in Scanning Microscopes

Kruit, P., van Ravesteijn, VF., Rieger, B., Berwald, F. & van der Linden, JHM., 2012, From Scientific Instrument to Industrial Machine Coping with Architectural Stress in Embedded Systems. Doornbos, R. & van Loo, S. (eds.). s.n.: Springer, p. 98-102 112 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeChapterScientific

Confocal cathodoluminescence microscope

Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2012, IPC No. Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. NL 2005080 C, Priority date 17 Jan 2012

Research output: Patent

Design and fabrication of a miniaturized gas ionization chamber for production of high quality ion beams

Jun, DS., Kutchoukov, VG., Heerkens, CTH. & Kruit, P., 2012, In : Microelectronic Engineering. 97, p. 134-137 4 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Lithography system, method of heat dissipation and frame

Kruit, P., Dansberg, MP. & Wieland, MJJ., 2012, IPC No. Applicant: Mapper Lithography IP BV, Patent No. US 8325321 B2, Priority date 4 Dec 2012

Research output: Patent

Multiple beam charged particle optical system

van Bruggen, MJ. & Kruit, P., 2012, Patent No. US 8134135 B2, Priority date 13 Mar 2012

Research output: Patent

Multiple beam charged particle optical system

Kruit, P. & Zonnevylle, AC., 2012, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. US 8294117 B2, Priority date 23 Oct 2012

Research output: Patent

2011

Charged particle beam exposure system

Kruit, P., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868307, Priority date 11 Jan 2011

Research output: Patent

Charged particle beamlet exposure system

Kruit, P., 2011, IPC No. aanvrager: MAPPER Lithography B.V., Patent No. EP1830384, Priority date 14 Sep 2011

Research output: Patent

Charged particle multi-beamlet apparatus

Kruit, P. & Zonnevylle, CA., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US61/491865, Priority date 31 May 2011

Research output: Patent

Design and Fabrication of a Miniaturized Gas Ionization Chamber for Production of High Quality Ion Beams

Jun, DS., Kutchoukov, VG. & Kruit, P., 2011, Proceedings of the 37th International Conference on Micro and Nano Engineering. nn (ed.). Berlin: nn, p. 1-4 4 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Electron-Beam-Induced of 3.5 nm Half-Pitch Dense Patterns on Bulk Si

van Oven, J. C., Berwald, F., Berggren, KK., Kruit, P. & Hagen, CW., 2011, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 29, 6, p. 1-6 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
40 Citations (Scopus)
11 Citations (Scopus)

Lithography system, sensor and measuring method

Kruit, P., Slot, E., Teepen, TF., Wieland, MJJ. & Steenbrink, SWHK., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868300B2, Priority date 11 Jan 2011

Research output: Patent

Multiple beam charged particle optical system

Kruit, P. & Zonnevylle, AC., 2011, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. WO 2010050603 A1, Priority date 24 Mar 2011

Research output: Patent

Parallel electron-beam-induces deposition using a multi-beam scanning electron microscope

Post, P. C., Mohammadi-Gheidari, A., Hagen, CW. & Kruit, P., 2011, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 29

Research output: Contribution to journalArticleScientificpeer-review

Projection lens arrangement

Wieland, JJ., Kampherbeek, BJ., van Veen, AHV., Kruit, P. & Steenbrink, SWHK., 2011, IPC No. H01L, B82Y, H01J, G03F, G01J, G21K, Patent No. EP 2279515 B1, Priority date 28 Feb 2008

Research output: Patent

Simulation of ion imaging: Sputtering, contrast, noise

Castaldo, V., Hagen, CW. & Kruit, P., 2011, In : Ultramicroscopy. 111, p. 982-994 13 p.

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)

The influence of gun design on Coulomb-interactions in a field emission gun

Verduin, T., Cook, BJ. & Kruit, P., 2011, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 29, 6

Research output: Contribution to journalArticleScientificpeer-review

5 Citations (Scopus)
2010

Brightness limitations of cold field emitters caused by Coulomb interactions

Cook, BJ., Verduin, T., Hagen, CW. & Kruit, P., 2010, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 28, C6C74, p. 1-6 6 p.

Research output: Contribution to journalArticleScientificpeer-review

15 Citations (Scopus)

'Collapsing rings' on Schottky electron emitters

Bronsgeest, MS. & Kruit, P., 2010, In : Ultramicroscopy. 110, 9, p. 1243-1254 12 p.

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)

Design of an aberration corrected low-voltage SEM

van Aken, RH., Maas, D. J., Hagen, CW., Barth, JE. & Kruit, P., 2010, In : Ultramicroscopy. 110, 11, p. 1411-1419 9 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Electrostatic rotator for alignment purposes in multi electron beam systems

Zonnevylle, AC., Heerkens, CTH., Kruit, P., Wieland, ML., Postma, FM. & Steenbrink, SWHK., 2010, In : Microelectronic Engineering. 87, 5-8, p. 1095-1099 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Lithography system

Wieland, MJJ., van 't Spijker, JC., Jager, R. & Kruit, P., 2010, IPC No. Aanvrager: x, Patent No. US2010045958 A1, Priority date 25 Feb 2010

Research output: Patent

Lithography system and projection method

Kruit, P., Wieland, MJJ., Steenbrink, S. & Jager, R., 2010, IPC No. Verleend. Aanvrager: Mapper Lithography, Patent No. US7842936 B2, Priority date 30 Nov 2010

Research output: Patent

Lithography system comprising dispenser cathode

Kruit, P. & Steenbrink, S., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. EP2267747 A1, Priority date 29 Dec 2010

Research output: Patent