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Research Output

2007

In situ monitoring and control of material growth for high resolution electron beam induced deposition

van Dorp, WF., Hagen, CW., A. Crozier, P. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 6, p. 2210-2214 5 p.

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)

Multi-apertuur electronenlens

Kruit, P. & van Someren, B., 2007, IPC No. Aanvrager: TU Delft, Patent No. NL1032066, Priority date 14 Mar 2007

Research output: Patent

Optical Switching in Lithographic System

Wieland, M. J. J., van 't Spijker, J. C., Jager, R. & Kruit, P., 2007, IPC No. Aanvrager: Mapper Lithography, Patent No. 7,173,263, Priority date 6 Feb 2007

Research output: Patent

Solutions to a proxomity effect in high resolution electron beam induced deposition

van Dorp, WF., Lazar, S., Hagen, CW. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 5, p. 1603-1608 6 p.

Research output: Contribution to journalArticleScientificpeer-review

20 Citations (Scopus)

System, Method and Apparatus for Multi-Beam Lithography including a Dispenser Cathode for homogeneous electron Emission

Steenbrink, S. W. H. K. & Kruit, P., 2007, IPC No. Aanvrager: Mapper Lithography, Patent No. US7215070 B2, Priority date 8 May 2007

Research output: Patent

Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography

Dokania, AK., Velthuis, JFM., Zhang, Y. & Kruit, P., 2007, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 25, 2, p. 504-507 4 p.

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)

The role of MEMS in Maskless Lithography

Kruit, P., 2007, In : Microelectronic Engineering. 84, 5-8, p. 1027-1032 6 p.

Research output: Contribution to journalArticleScientificpeer-review

24 Citations (Scopus)
2006

Aberration model of a multi beam scanning microscope for electron beam-induced deposition

van Bruggen, MJ., van Someren, B. & Kruit, P., 2006, In : Scanning: the journal of scanning microscopies. 28, 1, p. 42-47 6 p.

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)

Adjustment in a Mapper System

Kruit, P., 2006, IPC No. Aanvrager: Mapper Lithography B.V., Patent No. US 7,019,312, Priority date 28 Mar 2006

Research output: Patent

Apparatus for generating a plurality of beamlets

Kruit, P., 2006, IPC No. aanvrager: Mapper Lithography IP B.V., Patent No. US 7,129,502, Priority date 31 Oct 2006

Research output: Patent

Charged particle beamlet exposure system

Wieland, M. J. J. & Kruit, P., 2006, IPC No. aanvrager: Mapper Lithography IP B.V., Patent No. US 7,084,414, Priority date 1 Aug 2006

Research output: Patent

Diffraction patterns of artificial 2-d crystals synthesized in sItu in an environmental scanning transmission electron microscope

van Dorp, WF., van Someren, B., Hagen, CW., Kruit, P. & A. Crozier, P., 2006, In : Journal of Microscopy. pt 3 March, 2006, p. 159-163 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Integrated Multi-electron-beam blanker array for sub-10-nm electron beam induced deposition

Zhang, Y., Heerkens, CTH., van Bruggen, MJ. & Kruit, P., 2006, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 24, 6, p. 2857-2860 4 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Method of Manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element

Jager, P. W. H., Kruit, P., Bleeker, AJ. & van der Mast, KD., 2006, IPC No. Aanvrager: Elith LLC, Tempe AZ (US), Agere Systems Guardian Corp., Orlando, FL (US), Patent No. US 7,102.732, Priority date 5 Sep 2006

Research output: Patent

Microröntgenbron

Kruit, P., Hagen, CW. & Mulder, EH., 2006, IPC No. aanvrager: TU Delft, Patent No. 1028481 Ned.Octrooi, Priority date 11 Sep 2006

Research output: Patent

Multi Beam electron source for nanofabrication using electron beam induced deposition

van Bruggen, MJ., van Someren, B. & Kruit, P., 2006, In : Microelectronic Engineering. 83, 4-9, p. 771-775 5 p.

Research output: Contribution to journalArticleScientificpeer-review

5 Citations (Scopus)

Multibeam Electron Source using MEMS Electron Optical Components

van Someren, B., van Bruggen, MJ., Zhang, Y., Hagen, CW. & Kruit, P., 2006, In : Journal of Physics D: Applied Physics. C. Series, 34, p. 1092-1097 6 p.

Research output: Contribution to journalArticleScientificpeer-review

5 Citations (Scopus)

Multibeamsource Schottky (Multibundel Electronenbron: Inrichting voor het opwekken van evenwijdige stralenbundeldelen)

Kruit, P. & van Bruggen, MJ., 2006, IPC No. Aanvrager: TU Delft, Patent No. 1029132 Ned.Octrooi, Priority date 28 Nov 2006

Research output: Patent

Multibeam STEM (Scanningstransmissie Electronenmicroscoop)

Kruit, P., 2006, IPC No. aanvrager: TU Delft, Patent No. 1029129 Ned. Octrooi, Priority date 28 Nov 2006

Research output: Patent

One nanometer structure fabrication using electron beam induced deposition

van Dorp, WF., Hagen, CW., A. Crozier, P., van Someren, B. & Kruit, P., 2006, In : Microelectronic Engineering. 83, 4-9, p. 1468-1470 3 p.

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)

Predicted effect of shot noise on contact hole dimension in e-beam lithography

Kruit, P., Steenbrink, S. & Wieland, M. J. J., 2006, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. B 24, Nov/Dec, p. 2931-2935 5 p.

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)

Resolution limit for Electron-Beam induced Deposition on thick substrates

Hagen, CW., Silvis-Cividjian, N. & Kruit, P., 2006, In : Scanning: the journal of scanning microscopies. 28, 4, p. 204-211 8 p.

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Shot noise in electron-beam lithography and line-width measurements

Kruit, P. & Steenbrink, S., 2006, In : Scanning: the journal of scanning microscopies. 28, 1, p. 20-26 7 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Source brightness and useful beam current of carbon nanotubes and other very small emitters

Kruit, P., Bezuijen, M. & Barth, JE., 2006, In : Journal of Applied Physics. 99, p. 024315-1/7

Research output: Contribution to journalArticleScientificpeer-review

38 Citations (Scopus)

Statistical variation analysis of sub-5 nanometer sized electron beam induced depositis

van Dorp, WF., van Someren, B., Hagen, CW., Kruit, P. & A. Crozier, P., 2006, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 2, p. 618-622 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2005

Approaching the resolution limit of nanometer-scale electron beam-induced deposition

van Dorp, WF., van Someren, B., Hagen, CW., Kruit, P. & A. Crozier, P., 2005, In : Nano Letters: a journal dedicated to nanoscience and nanotechnology. 5, 7, p. 1303-1307 5 p.

Research output: Contribution to journalArticleScientificpeer-review

223 Citations (Scopus)

Design Approach for a Multi Beam Electron Beam Induced Deposition System

van Someren, B., van Bruggen, MJ. & Kruit, P., 2005, In : Scanning: the journal of scanning microscopies. 27, 2, p. 107-108 2 p.

Research output: Contribution to journalArticleScientificpeer-review

Development of a multi electron beam source for sub-10 nm electron beam induced deposition

van Bruggen, MJ., van Someren, B. & Kruit, P., 2005, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 23, 6, p. 2833-2839 7 p.

Research output: Contribution to journalArticleScientificpeer-review

22 Citations (Scopus)

Direct write lithography system

Kruit, P., 2005, IPC No. Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands, Patent No. US 6,919,952, Priority date 19 Jul 2005

Research output: Patent

10 Citations (Scopus)

Electron beam exposure system

Wieland, M., Kampherbeek, B., van Veen, A. & Kruit, P., 2005, IPC No. A61N, H01L, B82Y, H01J, G03B, G03F, G01Q, Patent No. US 6897458 B2, Priority date 30 Oct 2002

Research output: Patent

Electron microscope (nanospleten)

Kruit, P. & Mook, HW., 2005, IPC No. EP 1105913 B1, PCT/NL1999/000535,aanvrager: TU Delft, Patent No. WO0013200, Priority date 4 May 2005

Research output: Patent

Fabrication and characterization of p-type silicon field-emitter arrays for lithography

Teepen, TF., van 't Spijker, H., Steenbrink, S., Zuuk, A. V., Heerkens, CTH., van Druten, N., Wieland, M. & Kruit, P., 2005, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 23, 2, p. 359-369 11 p.

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Lithography system

Wieland, M., van Spijker, J., Jager, R. & Kruit, P., 2005, IPC No. verleend; Aanvrager: Mapper Lithography IP B.V., Delft, The Netherlands, Patent No. US 6,958,804, Priority date 25 Oct 2005

Research output: Patent

Lithography system comprising a converter plate and means for protecting the converter plate

Wieland, M., Kampherbeek, B. & Kruit, P., 2005, IPC No. verleend; aanvrager: Mapper Lithography IP B.V., Patent No. US6,844,560, Priority date 18 Jan 2005

Research output: Patent

Local critical dimension variation from shot-noise related line edge roughness

Kruit, P. & Steenbrink, S., 2005, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 23, 6, p. 3033-3036 4 p.

Research output: Contribution to journalArticleScientificpeer-review

47 Citations (Scopus)

Multibeam electron source for nanofrabrication and multibeam imaging

van Someren, B., van Bruggen, MJ. & Kruit, P., 2005, Proceedings of the NVvM 2005 meeting, Jaarboek 2005. p. 30-31 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Nanolithography in an environmental scanning transmission electron microscope

van Dorp, WF., Hagen, CW., A. Crozier, P., van Someren, B. & Kruit, P., 2005, Proceedings of the NVvM 2005 meeting, Jaarboek 2005. p. 98-99 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Resolution limit for Electron-Beam-Induced-Deposition on thick substrates

Hagen, CW., Silvis-Cividjian, N. & Kruit, P., 2005, In : Scanning: the journal of scanning microscopies. 27, 2, p. 90-91 2 p.

Research output: Contribution to journalArticleScientificpeer-review

Resolution limits in electron-beam-induced deposition

Kruit, P., van Dorp, WF., van Someren, B., Silvis-Cividjian, N. & Hagen, CW., 2005, Proceedings Conference APF 10. Kido, G. (ed.). National Institute of Materials Science, p. 9-16 8 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

87 Citations (Scopus)

Shot noise in electron beam lithography and line width measurements

Kruit, P. & Steenbrink, S., 2005, In : Scanning: the journal of scanning microscopies. 27, 2, p. 67-68 2 p.

Research output: Contribution to journalArticleScientificpeer-review

Spatial resolution limits in electron-beam-induced deposition

Silvis-Cividjian, N., Hagen, CW. & Kruit, P., 2005, In : Journal of Applied Physics. 98, 8, p. 084905-1-084905-12

Research output: Contribution to journalArticleScientificpeer-review

87 Citations (Scopus)

Target voor micro rontgenbron

Kruit, P., 2005, IPC No. Aanvrager: TUD, Patent No. NL1028481, Priority date 15 Jul 2005

Research output: Patent

2004

100 Volumes of Ultramicroscopy

Kruit, P., 2004, In : Ultramicroscopy. 1-2, p. xi-xiv

Research output: Contribution to journalArticleScientificpeer-review

Electron beam exposure system

Wieland, MJJ., van Veen, AHV., Kampherbeek, BJ. & Kruit, P., 2004, IPC No. A61N, H01L, B82Y, H01J, G03B, G03F, G01Q, Priority date 30 Oct 2002, Priority No. WO 2004040614 A2

Research output: Patent

Electron beam induced deposition and in-situ inspection of sub-10 nm structures

van Bruggen, MJ., van Dorp, WF., van Someren, B., Silvis-Cividjian, N., Hagen, CW. & Kruit, P., 2004, Proceedings of the 13th Eurepean Microscopy Congress. p. 175-176 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Electron microlenses and microlens arrays

van Bruggen, MJ., van Someren, B. & Kruit, P., 2004, Proceedings of the 9th International Seminar "Recent trends in charged particle optics and surface physics instrumentation". Brno: Institure of Scientific Instruments AS CR, p. 17-18 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Electron optical device for low-energy foil aberration correction, verleend

Kruit, P. & van Aken, RH., 2004, IPC No. aanvrager: TUD en FOM OCT-02-011, Patent No. WO 2004/021391 A1, Priority date 11 Mar 2004

Research output: Patent

Fabrication and characterization of silicon carbide field-emitter array

Zuuk, A. V., Heerkens, C. T. H., van Veen, AHV., Teepen, T. F., Wieland, MJJ., Groening, O. & Kruit, P., 2004, In : Microelectronic Engineering. 73-74, p. 106-110 5 p.

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Influence of surface roughness on space charge limited emission

Nijkerk, MD. & Kruit, P., 2004, In : Applied Surface Science. 233, p. 172-179 8 p.

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)