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Research Output

2004

On the performance of an energy filter for a high brightness electron gun

Cubric, D., van Kranen, SR., Kruit, P. & Kumashiro, S., 2004, Proceedings of the 9th Intern. Seminar 'Recent trends in charged particle optics and surface physics instrumentation'. p. 19-20 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Optimum dose for shot noise limited CD uniformity in E-beam lithography

Kruit, P., Steenbrink, S., Jager, R. & Wieland, MJJ., 2004, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 22, 6, p. 2948-2955 8 p.

Research output: Contribution to journalArticleScientificpeer-review

37 Citations (Scopus)

Stochastic Coulomb Interactions in Space Charge Limited Electron Emission

Nijkerk, MD. & Kruit, P., 2004, In : Journal of Applied Physics. 96, 5, p. 2985-2989 5 p.

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)
2003

Direct fabrication of nanowires in an electron microscope

Silvis-Cividjian, N., Hagen, CW., Kruit, P., van der Stam, MAJ. & Groen, HB., 2003, In : Applied Physics Letters. 82, 20, p. 3514-3516 3 p.

Research output: Contribution to journalArticleScientificpeer-review

101 Citations (Scopus)

Electron microscope: Verleend

Mook, HW. & Kruit, P., 2003, Patent No. US6670611, Priority date 30 Dec 2003

Research output: Patent

Lithographic apparatus, device manufacturing method, and device manufactured thereby: Verleend, niet eerder opgenomen

de Jager, PWJ., Kruit, P., Bleeker, AJ. & van der Mast, KD., 2003, IPC No. Verleend, niet eerder opgenomen, Patent No. US 2002/0054284 A1, Priority date 9 May 2002

Research output: Patent

Stable field emission from W tips in poor vacuum conditions

Tondare, VN., van Druten, NJ., Hagen, CW. & Kruit, P., 2003, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 21, 4, p. 1602-1606 5 p.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)
2002

Adjustment in a MAPPER system

Kruit, P., 2002, IPC No. aangevraagd door Mapper Lithography B.V., Patent No. PCTP 164137, Priority date 20 Jun 2002

Research output: Patent

Concept for a low energy foil corrector

van Aken, RH., Hagen, CW., Barth, JE. & Kruit, P., 2002, Physics and Materials; proceedings of 15th International Congress on Electron Microscopy, Durban, South Africa, 1-6 sept. 2002. p. 1101-1102 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Design of an Electron Projection System with Slider Lenses and Multiple Beams

Moonen, D., Leunissen, LHA., de Jager, PWH., Kruit, P., Bleeker, AJ. & van der Mast, KD., 2002, Proceedings SPIE. SPIE, p. 932-943 12 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Direct write lithography system

Kruit, P., 2002, IPC No. aangevraagd door Mapper Lithography B.V., Patent No. PCTP 164759, Priority date 19 Mar 2002

Research output: Patent

DIY in ICT: faculty members develop their own implementations of ICT in Education

van Daalen, C., Dopper, S. M., Dijkema, GPJ., de Haan, ARC., Herder, PM., Kruit, P. & Sjoer, E., 2002, The Renaissance Engineer of Tomorrow. C Borri & TU Weck (eds.). Firenze: Edizioni Polistampa, p. 1-8 8 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Lithography method

Jager, R., van 't Spijker, JC., Wieland, MJJ. & Kruit, P., 2002, IPC No. aangevraagd door Mapper Lithography B.V., Patent No. PCTP 167536A, Priority date 25 Oct 2002

Research output: Patent

Lithography system

Kruit, P., 2002, IPC No. United States, ook onder andere nummers voor Europa, Japan, Korea en Singapore, Patent No. US 6335783, Priority date 1 Jan 2002

Research output: Patent

Lithography system comprising of a converter plate and means for protecting the converter plate

Kruit, P., Kampherbeek, BJ. & Wieland, MJJ., 2002, IPC No. aangevraagd door Mapper Lithography B.V., Patent No. PCT-NL-02-00541, Priority date 13 Aug 2002

Research output: Patent

Low-energy foil aberration corrector

Kruit, P. & van Aken, RH., 2002, IPC No. aangevraagd door TU Delft en Stichting FOM, Patent No. OCT-02-01, Priority date 26 Aug 2002

Research output: Patent

8 Citations (Scopus)

Low-energy foil aberration corrector

van Aken, RH., Hagen, CW., Barth, JE. & Kruit, P., 2002, In : Ultramicroscopy. 93, 3-4, p. 321-330 10 p.

Research output: Contribution to journalArticleScientificpeer-review

8 Citations (Scopus)

Scanning transmission electron microscopy at sub-eV energy

Rensen, M. J. M., van Aken, RH., Hagen, CW. & Kruit, P., 2002, Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. L. Frank (ed.). Brno: Czechoslovak Microscopy Society, p. S-5-S-6

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Van meter tot micron, Jan Bart Le Poole, Hoogleraar Elektronen Optica van 1957 tot 1982

Kruit, P. & Kool-Tijssen, DJJ., 2002, Lustrumboek TU Delft. p. 250-263 14 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeChapterPopular

2001

Aberations of the electron optical systemof MAPPER

van Veen, AHV. & Kruit, P., 2001, s.l.: s.n. 26 p.

Research output: Book/ReportReportProfessional

A simple fabrication method for tunnel junction emitters.

van Aken, RH., Janssen, MAPM., Hagen, CW. & Kruit, P., 2001, In : Solid-State Electronics. 45, p. 1033-1038 6 p.

Research output: Contribution to journalArticleScientificpeer-review

2 Citations (Scopus)

Computer simulations for standing wave illumination.

de Jong, NW., Hagen, CW. & Kruit, P., 2001, Proceedings of the NVvM 2001 meeting.. p. 100-101 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Design of the electron optical part of the mapper machine.

Jager, R. & Kruit, P., 2001, s.l.: s.n. 30 p.

Research output: Book/ReportReportProfessional

Elemental analysis at the nanometer level by Auger microscopy.

van Bruggen, MJ., van Es, JJP., Kruit, P. & van Langeveld, AD., 2001, Proceedings of the NVvM 2001 meeting.. p. 88-89 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Field emission photocathode array for high throughput lithography.

van Veen, AHV., Kampherbeek, BJ., Wieland, MJJ. & Kruit, P., 2001, Proceedings of the 14th International Vacuum Microeelectronics Conference (IVMC).. p. 127-128 2 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

1 Citation (Scopus)

Field emission photocathode array for lithography system and lithography system provided with such an array.

Kampherbeek, BJ., Wieland, MJJ. & Kruit, P., 2001, Patent No. PCT/NL00/00657, Priority date 1 Jan 1800

Research output: Patent

Field emission photocathode array with additional layer to improve the yield and electron optical imaging system provided with such an array.

Wieland, MJJ., Kampherbeek, BJ. & Kruit, P., 2001, Patent No. PCT/NL00/00658, Priority date 1 Jan 1800

Research output: Patent

Field Emission Photocathode Arrray for multibeam electron lithography.

Wieland, MJJ., Kampherbeek, BJ., Addessi, P. & Kruit, P., 2001, In : Microelectronic Engineering. 57-58, p. 155-161 7 p.

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Illumination system for electron beam lithograpy tool.

Katsap, V., Kruit, P., Moonen, D. & Waskiewics, W., 2001, Patent No. US 633508 B1, Priority date 25 Dec 2001

Research output: Patent

Influence of the microchannel plate and anode gap parameters on the spatial resolution of an image intensifier.

Hoenderken, TH., Hagen, CW., Barth, JE., Kruit, P. & Nützel, GO., 2001, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 19, p. 843-850 8 p.

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)

Lithography system

Kruit, P., 2001, Patent No. US164746, Priority date 1 Jan 2002

Research output: Patent

Lithography system comprising a converter plate and means for protecting the converter plate.

Kampherbeek, BJ., Wieland, MJJ. & Kruit, P., 2001, Priority date 13 Aug 2001

Research output: Patent

Measurement report on sample w 109 k 15

Teepen, TF., van Veen, AHV. & Kruit, P., 2001, s.l.: s.n. 11 p.

Research output: Book/ReportReportProfessional

Measuring the in crease in effective emittance after a grid lens.

van Kranen, SR., Moonen, D. & Kruit, P., 2001, In : Microelectronic Engineering. 57-58, p. 173-179 7 p.

Research output: Contribution to journalArticleScientificpeer-review

Method and arrangement to reduce the loss of light in a lithograpy system.

Kampherbeek, BJ., Wieland, MJJ. & Kruit, P., 2001, Priority date 13 Aug 2001

Research output: Patent

New features in program package POCAD.

Leunissen, LHA., van der Stam, MAJ. & Kruit, P., 2001, Proceedings of SPIE.. p. 119-126 8 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Progress with the IBM very high resolution STEM.

Batson, PE., Mook, HW., Kruit, P., Krivanek, OL. & Dellby, N., 2001, Proceedings Microscopy and Microanalysis.. New York: Springer, p. -

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Projection systems for E-Beam.

Bleeker, AJ., Jager, PWH., Kruit, P. & van der Mast, KD., 2001, Priority date 1 Jan 1800

Research output: Patent

Reduced brightness of the ZrO/W Schottky electron emitter.

van Veen, AHV., Hagen, CW., Barth, JE. & Kruit, P., 2001, In : Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures. 19, p. 2038-2044 7 p.

Research output: Contribution to journalArticleScientificpeer-review

40 Citations (Scopus)

Simple model on the spectal response of the Field Emission Photocathode.

van Veen, AHV. & Kruit, P., 2001, Onbek.: Onbek. 13 p.

Research output: Book/ReportReportProfessional

2000

Advances in TEM instrumentation.

Kruit, P., 2000, Proceedings 12 th European congress on electron microscopy. p. 427-430 4 p.

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Afsluitbare aperture houder voor transmissie electronen microscopen.

van Harrewijn, P., van der Heijden, HTC. & Kruit, P., 2000, Delft: Delft University of Technology. 24 p.

Research output: Book/ReportReportProfessional

An experimental setup to test the MAPPER electron lithography concept.

Kampherbeek, BJ., Wieland, MJJ., Zuuk, A. & Kruit, P., 2000, In : Microelectronic Engineering. 53, 1-4, p. 279-282 4 p.

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Coincidence electron spectroscopy with nanometer scale resolution.

Kruit, P., 2000, Delft: Delft University of Technology. 5 p.

Research output: Book/ReportReportProfessional

Construction and characterization of the fringe field monochromator for a field emission gun.

Mook, HW. & Kruit, P., 2000, In : Ultramicroscopy. 81, 3/4, p. 129-139 11 p.

Research output: Contribution to journalArticleScientificpeer-review

59 Citations (Scopus)

Elektronen microscoop (nanospleten)

Kruit, P. & Mook, HW., 2000, Patent No. 1009959, Priority date 29 Feb 2000

Research output: Patent

Field emission photocathode array for multibeam electron lithography.

Kampherbeek, BJ., Wieland, MJJ. & Kruit, P., 2000, Patent No. PCT/NL00/00657, Priority date 15 Sep 2000

Research output: Patent

Field emission photocathode array with additional layer to improve the yield and electron optical imaging system provided with such an array.

Wieland, MJJ., Kampherbeek, BJ. & Kruit, P., 2000, Patent No. PCT/NL00/00657, Priority date 15 Sep 2000

Research output: Patent

Gun test station experiments & install improvements, Interim status report #4

van Kranen, SR., Moonen, D., Nijkerk, MD. & Kruit, P., 2000, s.l.: s.n. 50 p.

Research output: Book/ReportReportProfessional

Gun test station experiments & install improvements II, Interim status report #5

van Kranen, SR., Moonen, D., Nijkerk, MD. & Kruit, P., 2000, s.l.: s.n. 26 p.

Research output: Book/ReportReportProfessional