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Research Output

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Patent
2019

Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column

Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO 2019/164392

Research output: Patent

Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column

Kruit, P. & Naftali, R., 2019, IPC No. H01J, Patent No. US 10,395,887, Priority date 20 Feb 2018

Research output: Patent

Multi electron beam inspection apparatus

Kruit, P., 2019, IPC No. H01J, Patent No. CNZL201580057918.2, Priority date 4 Sep 2014

Research output: Patent

Signal separator for a multi-beam charged particle inspection apparatus

Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO2019/164391

Research output: Patent

Signal separator for a multi-beam charged particle inspection apparatus

Kruit, P. & Naftali, R., 2019, IPC No. H01J, Priority date 20 Feb 2018, Priority No. WO2019/164391

Research output: Patent

Signal separator for Multi electron beam inspection apparatus

Kruit, P. & Naftali, R., 2019, IPC No. H01J, Patent No. US 10,504,687, Priority date 20 Feb 2018

Research output: Patent

2018

Aberration correcting device for an electron microscope and an electron microscope comprising such a device

Kruit, P., 2018, IPC No. H01J, Priority date 22 Jul 2016, Priority No. WO 2018016961 A1

Research output: Patent

Method for inspecting a specimen and charged particle multi-beam device

Kruit, P. & Frosien, J., 2018, IPC No. H01J, Patent No. US 9,922,796, Priority date 1 Dec 2016

Research output: Patent

Method for inspecting a specimen and charged particle multi-beam device

Kruit, P. & Frosien, J., 2018, IPC No. H01J, Priority date 1 Dec 2016, Priority No. WO 2018/099756

Research output: Patent

2017

Apparatus and method for irradiating a surface of a sample using charged particle beams

Kruit, P., Scotuzzi, M. & Hagen, C. W., 2017, IPC No. H01J, Priority date 30 May 2016, Priority No. NL 2016853

Research output: Patent

2016

Multi electron beam inspection apparatus

Kruit, P., 2016, IPC No. H01J, Priority date 4 Sep 2014, Priority No. WO2016/036246

Research output: Patent

2015

Arrangement and method for transporting radicals

Kruit, P., 2015, IPC No. B08B; H05H; H01L; B82Y; G03F; H01J; F15D, Patent No. US 9123507 B2, Priority date 20 Mar 2012

Research output: Patent

Lithography system and projection method

Kruit, P., Jager, R., Steenbrink, S. W. H. K. & Wieland, MJJ., 2015, IPC No. Aanvrager: Mapper Lithography B.V., Patent No. USRE45552, Priority date 9 Jun 2015

Research output: Patent

Method for determining local concentration of markers in a sample

Kruit, P. & Hoogenboom, JP., 2015, IPC No. OCT-12-042Applicant: DELMIC B.V;, Patent No. NL 2012218 C, Priority date 10 Aug 2015

Research output: Patent

Parallel transmission electron detector for multi-beam scanning electron microscope

Zonnevylle, AC., Kruit, P. & Ren, Y., 2015, IPC No. OCT-14-003, Patent No. WO 2015/170969, Priority date 12 Nov 2015

Research output: Patent

2014

Apparatus and method for inspecting a surface of a sample

Kruit, P., 2014, IPC No. OCT-12-048, Patent No. 2009696, Priority date 29 Apr 2014

Research output: Patent

Confocal cathodoluminescence microscope

Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2014, IPC No. OCT-10-006Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. US 8895921 B2, Priority date 25 Nov 2014

Research output: Patent

Passieve compensatie van magne

Kruit, P., Overbeeke, F. & Gravendeel, B., 2014, IPC No. OCT-07-014, Patent No. 2017118, Priority date 14 May 2014

Research output: Patent

2013

Lithography system, method of clamping an wafer table

Kruit, P., de Boer, G. & Dansberg, MP., 2013, IPC No. Applicant: G de Boer, Mapper Lithography IP BV, MP Dansberg, P Kruit, Patent No. CN 101884016 B, Priority date 9 Oct 2013

Research output: Patent

2012

Confocal cathodoluminescence microscope

Kruit, P., Hoogenboom, JP. & Zonnevylle, AC., 2012, IPC No. Applicant: JB Hoogenboom, AC Zonnevylle, Delmic B.V, Patent No. NL 2005080 C, Priority date 17 Jan 2012

Research output: Patent

Lithography system, method of heat dissipation and frame

Kruit, P., Dansberg, MP. & Wieland, MJJ., 2012, IPC No. Applicant: Mapper Lithography IP BV, Patent No. US 8325321 B2, Priority date 4 Dec 2012

Research output: Patent

Multiple beam charged particle optical system

Kruit, P. & Zonnevylle, AC., 2012, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. US 8294117 B2, Priority date 23 Oct 2012

Research output: Patent

Multiple beam charged particle optical system

van Bruggen, MJ. & Kruit, P., 2012, Patent No. US 8134135 B2, Priority date 13 Mar 2012

Research output: Patent

2011

Charged particle beam exposure system

Kruit, P., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868307, Priority date 11 Jan 2011

Research output: Patent

Charged particle beamlet exposure system

Kruit, P., 2011, IPC No. aanvrager: MAPPER Lithography B.V., Patent No. EP1830384, Priority date 14 Sep 2011

Research output: Patent

Charged particle multi-beamlet apparatus

Kruit, P. & Zonnevylle, CA., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US61/491865, Priority date 31 May 2011

Research output: Patent

Lithography system, sensor and measuring method

Kruit, P., Slot, E., Teepen, TF., Wieland, MJJ. & Steenbrink, SWHK., 2011, IPC No. Aanvrager: MAPPER Lithography B.V., Patent No. US7868300B2, Priority date 11 Jan 2011

Research output: Patent

Multiple beam charged particle optical system

Kruit, P. & Zonnevylle, AC., 2011, IPC No. Applicant: MAPPER LITHOGRAPHY IP BV [NL];, Patent No. WO 2010050603 A1, Priority date 24 Mar 2011

Research output: Patent

Projection lens arrangement

Wieland, JJ., Kampherbeek, BJ., van Veen, AHV., Kruit, P. & Steenbrink, SWHK., 2011, IPC No. H01L, B82Y, H01J, G03F, G01J, G21K, Patent No. EP 2279515 B1, Priority date 28 Feb 2008

Research output: Patent

2010

Lithography system

Wieland, MJJ., van 't Spijker, JC., Jager, R. & Kruit, P., 2010, IPC No. Aanvrager: x, Patent No. US2010045958 A1, Priority date 25 Feb 2010

Research output: Patent

Lithography system and projection method

Kruit, P., Wieland, MJJ., Steenbrink, S. & Jager, R., 2010, IPC No. Verleend. Aanvrager: Mapper Lithography, Patent No. US7842936 B2, Priority date 30 Nov 2010

Research output: Patent

Lithography system comprising dispenser cathode

Kruit, P. & Steenbrink, S., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. EP2267747 A1, Priority date 29 Dec 2010

Research output: Patent

Method of inspecting a specimen surface, apparatus and use of fluorescent material

Nijkerk, MD. & Kruit, P., 2010, IPC No. Aanvrager: TNO. Verleend., Patent No. US7732762 B2, Priority date 8 Jun 2010

Research output: Patent

Particle-optical apparatus equipped with a gas ion source

Kruit, P. & Tondare, VN., 2010, IPC No. Aanvrager: Fei Company, Patent No. US7772564 B2, Priority date 10 Aug 2010

Research output: Patent

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Steenbrink, S. & Kruit, P., 2010, IPC No. Aanvrager: Mapper Lithography IP BV, Patent No. US2010219357 A1, Priority date 2 Sep 2010

Research output: Patent

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Steenbrink, SWHK. & Kruit, P., 2010, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US7710009 B2, Priority date 4 May 2010

Research output: Patent

2009

Apparatus for generating a plurality of beamlets

Kruit, P., 2009, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US 7,569,833 B2, Priority date 4 Aug 2009

Research output: Patent

Lithography system

Wieland, MJJ., van 't Spijker, JC., Jager, R. & Kruit, P., 2009, IPC No. Aanvrager: Mapper Lithography IP B.V., Patent No. US 7,612,866 B2, Priority date 3 Nov 2009

Research output: Patent

Lithography system, method of clamping an wafer table

de Boer, G., Dansberg, MP. & Kruit, P., 2009, IPC No. Heeft nieuwheidsrapport. Aanvrager: Mapper Lithography IP B.V., Patent No. US2009/0027649 A1, Priority date 29 Jan 2009

Research output: Patent

Method and apparatus for imaging

van Someren, B. & Kruit, P., 2009, IPC No. Heeft nieuwheidsrapport. Aanvrager: TU Delft, Patent No. US2009/0180192 A1, Priority date 16 Jul 2009

Research output: Patent

Projection lens arrangement

Wieland, MJJ., Kampherbeek, BJ., van Veen, A. H., Kruit, P. & Steenbrink, S. W. H. K., 2009, IPC No. heeft nieuwheidsrapport. Aanvrager: Mapper Lithography IP B.V., Patent No. US2009/0261267 A1, Priority date 22 Oct 2009

Research output: Patent

Projection Lens arrangement

Wieland, MJJ., Kampherbeek, BJ., van Veen, A. H., Kruit, P. & Steenbrink, S. W. H. K., 2009, IPC No. H01L, B82Y, H01J, G03F, G01J, G21K, Priority date 28 Feb 2008, Priority No. WO 2009106397 A1

Research output: Patent

Railway infrastructure

Kruit, P., van Overbeek, F. & Gravendeel, B., 2009, IPC No. Aanvrager: TU Delft. Incl. nieuwheidsrapport, Patent No. EP2017118 A1, Priority date 21 Jan 2009

Research output: Patent

Spoorweginfrastructuur

Kruit, P., van Overbeeke, F. & Gravendeel, B., 2009, IPC No. Aanvrager: TU Delft, Patent No. 2000756, Priority date 20 Jan 2009

Research output: Patent

2008

Apparatus for generating a plurality of beamlets ¿ Aligned aperture lens

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,365,338, Priority date 29 Apr 2008

Research output: Patent

Apparatus for generating a plurality of beamlets ¿ Proportional deflections

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,391,037, Priority date 24 Jun 2008

Research output: Patent

Apparatus for generating a plurality of beamlets ¿ Spatial filter

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,348,567, Priority date 25 Mar 2008

Research output: Patent

Charged particle beam exposure system ¿ Redundancy scan

Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. US 7,453,075, Priority date 18 Nov 2008

Research output: Patent

Dispenser cathode

Steenbreek, STWH. & Kruit, P., 2008, IPC No. aangevraagd door Mapper Lithography IP B.V. Delft, Patent No. EP 1593140, Priority date 20 Aug 2008

Research output: Patent

Lens array for electron beam lithography tool

Katsap, V., Kruit, P., Moonen, D. & Waskiewicz, WK., 2008, IPC No. aangevraagd door Agere Systems Inc, Allentown, PA, USA, Patent No. US 7,345,290, Priority date 18 Mar 2008

Research output: Patent