Methods for designing and fabricating a pupil intensity mask

E.C.M. Carroll (Inventor), N.G. Ceffa (Inventor)

Research output: Patent

Original languageEnglish
IPCG02B, G03F, G01N
Priority date15/05/20
Publication statusPublished - 2021

Bibliographical note

Patent:OCT-19-101
Applicant: TU Delft

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