Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks

IGC Weppelman, PC Post, CTH Heerkens, CW Hagen, JP Hoogenboom

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)77-82
JournalMicroelectronic Engineering
Volume153
DOIs
Publication statusPublished - 2016

Bibliographical note

Harvest

Keywords

  • masks
  • nanostructures
  • EBID
  • Dry etching

Cite this