A Comparative Analysis of the Junction Formation Mechanisms of the Boron on Silicon Junction

Piet Fang*, Stoyan Nihtianov

*Corresponding author for this work

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Abstract

Photodiodes based on the Boron on Silicon junction (B-Si) show excellent responsivity to DUV and VUV photons, radiation hardness, and impressive electrical characteristics. However, the proposed models describing the junction formation mechanism do not sufficiently predict the junction's properties. We analyze two previously proposed models: the ultra-shallow p-n junction model and the charge transfer heterojunction model. We additionally apply the Schottky-Mott theory, a semiconductor-metal heterojunction model. Both the commonalities and incompatibilities between these models are discussed.

Original languageEnglish
Title of host publication2024 33rd International Scientific Conference Electronics, ET 2024 - Proceedings
PublisherIEEE
Number of pages6
ISBN (Electronic)9798350376449
DOIs
Publication statusPublished - 2024
Event33rd International Scientific Conference Electronics, ET 2024 - Sozopol, Bulgaria
Duration: 17 Sept 202419 Sept 2024

Publication series

Name2024 33rd International Scientific Conference Electronics, ET 2024 - Proceedings

Conference

Conference33rd International Scientific Conference Electronics, ET 2024
Country/TerritoryBulgaria
CitySozopol
Period17/09/2419/09/24

Bibliographical note

Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care
Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.

Keywords

  • barrier height
  • charge-transfer junction model
  • First-principles
  • heterojunction
  • p-n junction
  • Schottky-Mott theory

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