A novel micromachining process using pattern transfer over large topography for RF silicon technology

PN Pham; PM Sarro; TK Ng; R Behzad; JN Burghartz

A novel micromachining process using pattern transfer over large topography for RF silicon technology

PN Pham, PM Sarro, TK Ng, R Behzad, JN Burghartz

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	SAFE-ProRISC-SeSens 2000: proceedings
Editors	JP Veen
Place of Publication	Utrecht
Publisher	STW Technology Foundation
Pages	125-128
Number of pages	4
ISBN (Print)	90-73461-24-3
Publication status	Published - 2000
Event	Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven - Utrecht Duration: 28 Nov 2001 → 30 Nov 2001

Publication series

Name
Publisher	STW technology foundation

Conference

Conference	Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven
Period	28/11/01 → 30/11/01

Keywords

ZX Int.klas.verslagjaar < 2002

Cite this

@inproceedings{86e876473e694ebfa4d83d0aa374a78c,

title = "A novel micromachining process using pattern transfer over large topography for RF silicon technology",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "PN Pham and PM Sarro and TK Ng and R Behzad and JN Burghartz",

year = "2000",

language = "Undefined/Unknown",

isbn = "90-73461-24-3",

publisher = "STW Technology Foundation",

pages = "125--128",

editor = "{JP Veen}",

booktitle = "SAFE-ProRISC-SeSens 2000: proceedings",

note = "Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven ; Conference date: 28-11-2001 Through 30-11-2001",

}

Pham, PN, Sarro, PM, Ng, TK, Behzad, R & Burghartz, JN 2000, A novel micromachining process using pattern transfer over large topography for RF silicon technology. in JP Veen (ed.), SAFE-ProRISC-SeSens 2000: proceedings. STW Technology Foundation, Utrecht, pp. 125-128, Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven, 28/11/01.

A novel micromachining process using pattern transfer over large topography for RF silicon technology. / Pham, PN; Sarro, PM; Ng, TK et al.
SAFE-ProRISC-SeSens 2000: proceedings. ed. / JP Veen. Utrecht: STW Technology Foundation, 2000. p. 125-128.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - A novel micromachining process using pattern transfer over large topography for RF silicon technology

AU - Pham, PN

AU - Sarro, PM

AU - Ng, TK

AU - Behzad, R

AU - Burghartz, JN

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 90-73461-24-3

SP - 125

EP - 128

BT - SAFE-ProRISC-SeSens 2000: proceedings

A2 - JP Veen, null

PB - STW Technology Foundation

CY - Utrecht

T2 - Semiconductor Advances for Future Electronics - Program for Research on Integrated Systems and Circuits - Semiconductor Sensor and Actuator Technology, Veldhoven

Y2 - 28 November 2001 through 30 November 2001

ER -