A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure

WJ Venstra, M Laros, JW Spronck, PM Sarro, J. Eijk

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	Eurosensors XVIII
Editors	Palombie
Place of Publication	Rome
Publisher	University of Rome
Pages	313-316
Number of pages	4
ISBN (Print)	88-7621-282-5
Publication status	Published - 2004
Event	Eurosensors XVIII - Rome, Rome, Italy Duration: 13 Sept 2004 → 15 Sept 2004

Name
Publisher	University of Rome

Keywords

@inproceedings{de8f9c3e88ba48669f32b39c95cc8ebe,

title = "A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure",

keywords = "Conf.proc. > 3 pag",

author = "WJ Venstra and M Laros and JW Spronck and PM Sarro and J. Eijk",

year = "2004",

language = "Undefined/Unknown",

isbn = "88-7621-282-5",

publisher = "University of Rome",

pages = "313--316",

editor = "Palombie",

booktitle = "Eurosensors XVIII",

note = "Eurosensors XVIII ; Conference date: 13-09-2004 Through 15-09-2004",

}

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure

AU - Venstra, WJ

AU - Laros, M

AU - Spronck, JW

AU - Sarro, PM

AU - Eijk, J.

PY - 2004

Y1 - 2004

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 88-7621-282-5

SP - 313

EP - 316

BT - Eurosensors XVIII

A2 - Palombie, null

PB - University of Rome

CY - Rome

T2 - Eurosensors XVIII

Y2 - 13 September 2004 through 15 September 2004

ER -