A quantitative evaluation of pattern transfer across (111) surfaces in a (100) silicon wafer by contact masking and over-exposure

WJ Venstra, M Laros, JW Spronck, PM Sarro, J. Eijk

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationEurosensors XVIII
Editors Palombie
Place of PublicationRome
PublisherUniversity of Rome
Pages313-316
Number of pages4
ISBN (Print)88-7621-282-5
Publication statusPublished - 2004
EventEurosensors XVIII - Rome, Rome, Italy
Duration: 13 Sep 200415 Sep 2004

Publication series

Name
PublisherUniversity of Rome

Conference

ConferenceEurosensors XVIII
CountryItaly
CityRome
Period13/09/0415/09/04

Keywords

  • Conf.proc. > 3 pag

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