A study of reactive ion etching damage effects in GaN

B Rong, RJ Reeves, SA Brown, MM Alkaisi, EWJM van der Drift, R Cheung

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)585-595
Number of pages11
JournalMicroelectronic Engineering
Volume57-58
Publication statusPublished - 2001

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