A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	432-436
Number of pages	5
Journal	Korean Physical Society. Journal
Volume	54
Issue number	1
Publication status	Published - 2009

Keywords

@article{b5a4b2a3327a45babcb1ad1b12221c5f,

title = "A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process",

keywords = "CWTS JFIS < 0.75",

author = "J Derakhshandeh and {Tajari Mofrad}, MR and R Ishihara and {van der Cingel}, J and CIM Beenakker",

year = "2009",

language = "Undefined/Unknown",

volume = "54",

pages = "432--436",

journal = "Korean Physical Society. Journal",

issn = "0374-4884",

publisher = "Korean Physical Society",

number = "1",

}

TY - JOUR

T1 - A study of the CMP effect on the quality of thin silicon films crystallized by using the ¿-Czochralski process

AU - Derakhshandeh, J

AU - Tajari Mofrad, MR

AU - Ishihara, R

AU - van der Cingel, J

AU - Beenakker, CIM

PY - 2009

Y1 - 2009

KW - CWTS JFIS < 0.75

M3 - Article

SN - 0374-4884

VL - 54

SP - 432

EP - 436

JO - Korean Physical Society. Journal

JF - Korean Physical Society. Journal

IS - 1

ER -