TY - JOUR
T1 - Ray-based method for simulating cascaded diffraction in high-numerical-aperture systems
AU - Mout, Marco
AU - Flesch, Andreas
AU - Wick, Michael
AU - Bociort, Florian
AU - Petschulat, Joerg
AU - Urbach, Paul
N1 - Accepted Author Manuscript
PY - 2018/8/1
Y1 - 2018/8/1
N2 - The electric field at the output of an optical system is in general affected by both aberrations and diffraction. Many simulation techniques treat the two phenomena separately, using a geometrical propagator to calculate the effects of aberrations and a wave-optical propagator to simulate the effects of diffraction. We present a ray-based simulation method that accounts for the effects of both aberrations and diffraction within a single framework. The method is based on the Huygens–Fresnel principle, is entirely performed using Monte Carlo ray tracing, and, in contrast to our previously published work, is able to calculate the full electromagnetic field. The method can simulate the effects of multiple diffraction in systems with a high numerical aperture.
AB - The electric field at the output of an optical system is in general affected by both aberrations and diffraction. Many simulation techniques treat the two phenomena separately, using a geometrical propagator to calculate the effects of aberrations and a wave-optical propagator to simulate the effects of diffraction. We present a ray-based simulation method that accounts for the effects of both aberrations and diffraction within a single framework. The method is based on the Huygens–Fresnel principle, is entirely performed using Monte Carlo ray tracing, and, in contrast to our previously published work, is able to calculate the full electromagnetic field. The method can simulate the effects of multiple diffraction in systems with a high numerical aperture.
UR - http://resolver.tudelft.nl/uuid:a73ec6f3-fa6d-4d64-a0b6-fee263458773
UR - http://www.scopus.com/inward/record.url?scp=85050802761&partnerID=8YFLogxK
U2 - 10.1364/JOSAA.35.001356
DO - 10.1364/JOSAA.35.001356
M3 - Article
AN - SCOPUS:85050802761
SN - 1084-7529
VL - 35
SP - 1356
EP - 1367
JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision
JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision
IS - 8
ER -