@inproceedings{cc5b74d179e344d69f95ebc564c20400,
title = "Active shape control of transmissive optical elements.",
abstract = "Photolithography equipment manufacturers are continuously developing machines with ever increasing resolution and wafer throughput. The development has shown that previously less dominant performance limiting factors are increasingly impacting the conformity between the projected image and the object plane. It is evisaged that active optical elements are required for the correction of these non-conformities. This paper introduces the concept of active transmissive optical element shape control to improve focus whilst minimizing the effect of stress-biregringence and overlay.",
keywords = "Conf.proc. > 3 pag",
author = "CL Valentin and JPM Vermeulen and T Cadee and DJ Rixen and {Munnig Schmidt}, RH",
year = "2009",
language = "Undefined/Unknown",
isbn = "978-0-9553082-6-0",
publisher = "EUSPEN",
pages = "126--129",
editor = "E Brinksmeier and {van Brussel}, H",
booktitle = "Proceedings of the euSPEN International conference, San Sebastian, Spain",
note = "9th international conference of the european society for precision engineering and nanotechnology ; Conference date: 02-06-2009 Through 05-06-2009",
}