Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass

R Ishihara; PC van der Wilt; BD van Dijk; A Burtsev; FC Voogt; GJ Bertens; JW Metselaar; CIM Beenakker

Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass

R Ishihara, PC van der Wilt, BD van Dijk, A Burtsev, FC Voogt, GJ Bertens, JW Metselaar, CIM Beenakker

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

35 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	Proceedings of SPIE Vol. 4295
Editors	EF Kelley, T Voutsas
Place of Publication	Bellingham
Publisher	SPIE
Pages	14-23
Number of pages	10
ISBN (Print)	0-8194-3973-8
Publication status	Published - 2001
Event	Flat Panel Display Technology and Display Metrology II, San Jose - Bellingham Duration: 22 Jan 2001 → 23 Jan 2001

Publication series

Name
Publisher	SPIE Press

Conference

Conference	Flat Panel Display Technology and Display Metrology II, San Jose
Period	22/01/01 → 23/01/01

Keywords

ZX Int.klas.verslagjaar < 2002

Cite this

@inproceedings{6ae8608979ce414b82c96ff24c620f07,

title = "Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "R Ishihara and {van der Wilt}, PC and {van Dijk}, BD and A Burtsev and FC Voogt and GJ Bertens and JW Metselaar and CIM Beenakker",

year = "2001",

language = "Undefined/Unknown",

isbn = "0-8194-3973-8",

publisher = "SPIE",

pages = "14--23",

editor = "{EF Kelley} and {T Voutsas}",

booktitle = "Proceedings of SPIE Vol. 4295",

address = "United States",

note = "Flat Panel Display Technology and Display Metrology II, San Jose ; Conference date: 22-01-2001 Through 23-01-2001",

}

Ishihara, R, van der Wilt, PC, van Dijk, BD, Burtsev, A, Voogt, FC, Bertens, GJ, Metselaar, JW & Beenakker, CIM 2001, Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass. in EF Kelley & T Voutsas (eds), Proceedings of SPIE Vol. 4295. SPIE, Bellingham, pp. 14-23, Flat Panel Display Technology and Display Metrology II, San Jose, 22/01/01.

Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass. / Ishihara, R; van der Wilt, PC; van Dijk, BD et al.
Proceedings of SPIE Vol. 4295. ed. / EF Kelley; T Voutsas. Bellingham: SPIE, 2001. p. 14-23.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass

AU - Ishihara, R

AU - van der Wilt, PC

AU - van Dijk, BD

AU - Burtsev, A

AU - Voogt, FC

AU - Bertens, GJ

AU - Metselaar, JW

AU - Beenakker, CIM

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 0-8194-3973-8

SP - 14

EP - 23

BT - Proceedings of SPIE Vol. 4295

A2 - EF Kelley, null

A2 - T Voutsas, null

PB - SPIE

CY - Bellingham

T2 - Flat Panel Display Technology and Display Metrology II, San Jose

Y2 - 22 January 2001 through 23 January 2001

ER -