Agglomeration of amorphous silicon film with high energy density excimer laser irradiation

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NEO

Keywords

@article{972659954fe54edeb7e97f5f205b3ccd,

title = "Agglomeration of amorphous silicon film with high energy density excimer laser irradiation",

keywords = "Elektrotechniek, Techniek, academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "M He and R Ishihara and JW Metselaar and CIM Beenakker",

note = "NEO",

year = "2007",

language = "Undefined/Unknown",

volume = "515",

pages = "2872--2878",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Agglomeration of amorphous silicon film with high energy density excimer laser irradiation

AU - He, M

AU - Ishihara, R

AU - Metselaar, JW

AU - Beenakker, CIM

N1 - NEO

PY - 2007

Y1 - 2007

KW - Elektrotechniek

KW - Techniek

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 0040-6090

VL - 515

SP - 2872

EP - 2878

JO - Thin Solid Films

JF - Thin Solid Films

ER -