@inproceedings{1f25736674a247cc90c3e62a370a30e7,
title = "Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls",
keywords = "Conf.proc. > 3 pag",
author = "C Shen and HTM Pham and PM Sarro",
year = "2009",
language = "Undefined/Unknown",
publisher = "IEEE",
pages = "1071--1074",
editor = "K Najafi and M Schmidt",
booktitle = "The 15th International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2009, TECHNICAL DIGEST",
address = "United States",
}