Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls

C Shen, HTM Pham, PM Sarro

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

1 Citation (Scopus)
Original languageUndefined/Unknown
Title of host publicationThe 15th International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2009, TECHNICAL DIGEST
EditorsK Najafi, M Schmidt
PublisherIEEE Society
Pages1071-1074
Number of pages4
Publication statusPublished - 2009

Publication series

Name
PublisherIEEE

Keywords

  • Conf.proc. > 3 pag

Cite this

Shen, C., Pham, HTM., & Sarro, PM. (2009). Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls. In K. Najafi, & M. Schmidt (Eds.), The 15th International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers 2009, TECHNICAL DIGEST (pp. 1071-1074). IEEE Society.