AlSi(Cu) anodic oxide layers formed in H2SO4 at low temperature using different current waveforms.

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	232-240
Number of pages	9
Journal	Surface and Coatings Technology
Volume	165
Publication status	Published - 2003

Keywords

@article{2378ec79196e4ec5ae44c2b278ad0386,

title = "AlSi(Cu) anodic oxide layers formed in H2SO4 at low temperature using different current waveforms.",

keywords = "academic journal papers, ZX CWTS JFIS < 1.00",

author = "EL Fratila-Apachitei and J Duszczyk and L Katgerman",

year = "2003",

language = "Undefined/Unknown",

volume = "165",

pages = "232--240",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

}

TY - JOUR

T1 - AlSi(Cu) anodic oxide layers formed in H2SO4 at low temperature using different current waveforms.

AU - Fratila-Apachitei, EL

AU - Duszczyk, J

AU - Katgerman, L

PY - 2003

Y1 - 2003

KW - academic journal papers

KW - ZX CWTS JFIS < 1.00

M3 - Article

SN - 0257-8972

VL - 165

SP - 232

EP - 240

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -