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Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
Fatemeh S.M. Hashemi*, Li Ao Cao, Felix Mattelaer, Timo Sajavaara, J. Ruud Van Ommen, Christophe Detavernier
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
8
Citations
(Scopus)