TY - JOUR
T1 - Amplitude and phase beam shaping for highest sensitivity in sidewall angle detection
AU - Cisotto, Luca
AU - Urbach, H. Paul
PY - 2017/1/1
Y1 - 2017/1/1
N2 - In integrated circuits manufacturing, specific structures are used as tools to evaluate the quality of the lithographic process, and the shape of these structures is often described by a few parameters, of which in particular the sidewall angle suffers from considerable inaccuracies. Using scalar diffraction theory, we investigate whether a properly shaped cylindrically focused probing beam could increase the ability to detect tiny changes in this angle in the case of a cliff-like structure, modeled as a phase object. This paper describes the theoretical formulation used to calculate the optimized beam and compares its performance with the case of a focused plane wave.
AB - In integrated circuits manufacturing, specific structures are used as tools to evaluate the quality of the lithographic process, and the shape of these structures is often described by a few parameters, of which in particular the sidewall angle suffers from considerable inaccuracies. Using scalar diffraction theory, we investigate whether a properly shaped cylindrically focused probing beam could increase the ability to detect tiny changes in this angle in the case of a cliff-like structure, modeled as a phase object. This paper describes the theoretical formulation used to calculate the optimized beam and compares its performance with the case of a focused plane wave.
UR - http://www.scopus.com/inward/record.url?scp=85009260924&partnerID=8YFLogxK
U2 - 10.1364/JOSAA.34.000052
DO - 10.1364/JOSAA.34.000052
M3 - Article
AN - SCOPUS:85009260924
VL - 34
SP - 52
EP - 60
JO - Journal of the Optical Society of America A: Optics and Image Science, and Vision
JF - Journal of the Optical Society of America A: Optics and Image Science, and Vision
SN - 1084-7529
IS - 1
ER -