An optimization approach for 3D photolithography utilizing DMD maskless exposure system

X Ma, Y Kato, Y Hirai, FCM van Kempen, F van Keulen, T Tsuchiya, O Tabata

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageEnglish
Title of host publicationProceedings of the 7th Asia-Pacific Conference on Transducers and Micro/Nano Technologies
EditorsY-J Kim, W-Y Chung, et al
Place of PublicationKorea
PublisherKorean Sensors Society
Number of pages6
Publication statusPublished - 2014
EventAPCOT 2014, Daegu, Korea - Korea
Duration: 29 Jun 20142 Jul 2014

Publication series

PublisherKorean Sensors Society


ConferenceAPCOT 2014, Daegu, Korea

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