Anisotropic etching of silicon using a galvanic cell

PJ French, CMA Ashruf, PM Sarro, R Kazinczi, XH Xia, JJ Kelly

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationAbstracts booklet
Place of PublicationS.l.
Publishers.n.
Pages1-8
Number of pages8
Publication statusPublished - 2000
Event2nd Workshop on Physical Chemistry of Wet Etching of Silicon, Toulouse - S.l.
Duration: 15 May 200016 May 2000

Publication series

Name
PublisherS.n.

Conference

Conference2nd Workshop on Physical Chemistry of Wet Etching of Silicon, Toulouse
Period15/05/0016/05/00

Keywords

  • ZX Int.klas.verslagjaar < 2002

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