Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms

S Grachev, JD Kamminga, GCAM Janssen, T Smy, FD Tichelaar

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageUndefined/Unknown
    Pages (from-to)1184-1187
    Number of pages4
    JournalJournal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
    Issue number25
    Publication statusPublished - 2007


    • CWTS 0.75 <= JFIS < 2.00

    Cite this