Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms

S Grachev, JD Kamminga, GCAM Janssen, T Smy, FD Tichelaar

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1184-1187
Number of pages	4
Journal	Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Volume	2007
Issue number	25
Publication status	Published - 2007

Keywords

@article{b83189f2406443d58fa6c02968c7cdd4,

title = "Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "S Grachev and JD Kamminga and GCAM Janssen and T Smy and FD Tichelaar",

year = "2007",

language = "Undefined/Unknown",

volume = "2007",

pages = "1184--1187",

journal = "Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "25",

}

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Anisotropic microstructure of physical vapor deposited coatings caused by anisotropy in flux distribution of arriving atoms

AU - Grachev, S

AU - Kamminga, JD

AU - Janssen, GCAM

AU - Smy, T

AU - Tichelaar, FD

PY - 2007

Y1 - 2007

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 0734-2101

VL - 2007

SP - 1184

EP - 1187

JO - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

JF - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

IS - 25

ER -