Antireflective subwavelength patterning of IR optics

D. Vandormael*, S. Habraken, J. Loicq, C. Lenaerts, D. Mawet

*Corresponding author for this work

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

32 Citations (SciVal)

Abstract

Thermal infrared (IR) lenses require efficient anti-reflection coating. Moth-eye (or egg-box) 2D subwavelength gratings have demonstrated their ability to reach a very high transmission for a wide wavelength and angular range. The use in thermal IR is simplified by the lower resolution for lithographic technology, compared to visible waveband. However, deeper structures must be engraved and lithography must be adapted to IR materials. In order to be cost-effective, the patterning must be produced by replication techniques, such as embossing. Our laboratory is now experimenting hot embossing of moth-eye patterns in chalcogenide substrates. In this paper, theoretical analysis, micro-lithographic technology and manufacturing processes are detailed.

Original languageEnglish
Title of host publicationElectro-Optical and Infrared Systems
Subtitle of host publicationTechnology and Applications III
PublisherSPIE
ISBN (Print)0819464937, 9780819464934
DOIs
Publication statusPublished - 2006
Externally publishedYes
EventElectro-Optical and Infrared Systems: Technology and Applications III - Stockholm, Sweden
Duration: 13 Sept 200614 Sept 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6395
ISSN (Print)0277-786X

Conference

ConferenceElectro-Optical and Infrared Systems: Technology and Applications III
Country/TerritorySweden
CityStockholm
Period13/09/0614/09/06

Keywords

  • Antireflective
  • Infrared
  • Moth-eye
  • Replication

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