Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry.

ZX Jiang, S Backer, JJ Lee, LY Wu, T Guenther, D Sieloff, P Choi, M Foisy, PFA Alkemade

    Research output: Contribution to journalArticleScientificpeer-review

    2 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)1133-1137
    Number of pages5
    JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
    Issue number4
    Publication statusPublished - 2000


    • ZX Int.klas.verslagjaar < 2002

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