Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific

Original language	Undefined/Unknown
Title of host publication	Proceedings of the Transducers '01 - Eurosensors XV.
Editors	E Obermeier
Pages	612-615
Number of pages	4
Publication status	Published - 2001

Keywords

@inproceedings{3b5c8f24bbad43a3837894849c5dc0a5,

title = "Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "G Craciun and MA Blauw and {van der Drift}, EWJM and PJ French",

year = "2001",

language = "Undefined/Unknown",

isbn = "3-540-42150-5",

pages = "612--615",

editor = "E Obermeier",

booktitle = "Proceedings of the Transducers '01 - Eurosensors XV.",

}

TY - GEN

T1 - Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures.

AU - Craciun, G

AU - Blauw, MA

AU - van der Drift, EWJM

AU - French, PJ

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SN - 3-540-42150-5

SP - 612

EP - 615

BT - Proceedings of the Transducers '01 - Eurosensors XV.

A2 - Obermeier, E

ER -