Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures.

G Craciun, MA Blauw, EWJM van der Drift, PJ French

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publicationProceedings of the Transducers '01 - Eurosensors XV.
EditorsE Obermeier
Number of pages4
Publication statusPublished - 2001


  • ZX Int.klas.verslagjaar < 2002

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