Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Albert Santoso; Afke Damen; J. Ruud van Ommen; Volkert van Steijn

doi:10.1039/d2cc02402k

Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Albert Santoso, Afke Damen, J. Ruud van Ommen, Volkert van Steijn^*

^*Corresponding author for this work

ChemE/Product and Process Engineering

Research output: Contribution to journal › Article › Scientific › peer-review

2 Citations (Scopus)

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Abstract

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.

Original language	English
Article number	10805
Pages (from-to)	10805-10808
Journal	Chemical Communications
Volume	58
Issue number	77
DOIs	https://doi.org/10.1039/d2cc02402k
Publication status	Published - 2022

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10.1039/d2cc02402k

d2cc02402kFinal published version, 814 KBLicence: CC BY

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title = "Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS",

abstract = "We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.",

author = "Albert Santoso and Afke Damen and {van Ommen}, {J. Ruud} and {van Steijn}, Volkert",

year = "2022",

doi = "10.1039/d2cc02402k",

language = "English",

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T1 - Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

AU - Santoso, Albert

AU - Damen, Afke

AU - van Ommen, J. Ruud

AU - van Steijn, Volkert

PY - 2022

Y1 - 2022

N2 - We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.

AB - We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.

UR - http://www.scopus.com/inward/record.url?scp=85138628737&partnerID=8YFLogxK

U2 - 10.1039/d2cc02402k

DO - 10.1039/d2cc02402k

M3 - Article

C2 - 36073302

AN - SCOPUS:85138628737

SN - 1359-7345

VL - 58

SP - 10805

EP - 10808

JO - Chemical Communications

JF - Chemical Communications

IS - 77

M1 - 10805

ER -

Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

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Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

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