Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Albert Santoso, Afke Damen, J. Ruud van Ommen, Volkert van Steijn*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.

Original languageEnglish
Article number10805
Pages (from-to)10805-10808
JournalChemical Communications
Volume58
Issue number77
DOIs
Publication statusPublished - 2022

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