Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Albert Santoso, Afke Damen, J. Ruud van Ommen, Volkert van Steijn*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
27 Downloads (Pure)

Fingerprint

Dive into the research topics of 'Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS'. Together they form a unique fingerprint.

INIS

Chemical Engineering

Material Science