Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (ATIP): A Combined Experimental and Theoretical Study

Truong Ba Tai, Liao Cao, Felix Mattelaer, Geert Rampelberg, Fatemeh S.M. Hashemi, J. Ruud Van Ommen, Christophe Detavernier, Marie Françoise Reyniers*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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