Atomic radical abatement of organic impurities form electron beam deposited metallic structures

J.D. Wnuk, J.M. Gorham, S.G. Rosenberg, T.E. Madey, CW Hagen, D.H. Fairbrother

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	527-537
Number of pages	11
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	28
Issue number	(3)
Publication status	Published - 2010

Keywords

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title = "Atomic radical abatement of organic impurities form electron beam deposited metallic structures",

keywords = "CWTS JFIS < 0.75",

author = "J.D. Wnuk and J.M. Gorham and S.G. Rosenberg and T.E. Madey and CW Hagen and D.H. Fairbrother",

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language = "English",

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journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

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TY - JOUR

T1 - Atomic radical abatement of organic impurities form electron beam deposited metallic structures

AU - Wnuk, J.D.

AU - Gorham, J.M.

AU - Rosenberg, S.G.

AU - Madey, T.E.

AU - Hagen, CW

AU - Fairbrother, D.H.

PY - 2010

Y1 - 2010

KW - CWTS JFIS < 0.75

UR - http://avspublications.org/jvstb/resource/1/jvtbd9/v28/i3/p527_s1

M3 - Article

SN - 1071-1023

VL - 28

SP - 527

EP - 537

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - (3)

ER -