Balancing the etching and passivation in time-multiplexed deep dry etching of silicon.

MA Blauw, T Zijlstra, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2930-2934
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	19
Issue number	6
Publication status	Published - 2001

Keywords

@article{5b3ac138a99c41b5b715819e44dcb07e,

title = "Balancing the etching and passivation in time-multiplexed deep dry etching of silicon.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "MA Blauw and T Zijlstra and {van der Drift}, EWJM",

year = "2001",

language = "Undefined/Unknown",

volume = "19",

pages = "2930--2934",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Balancing the etching and passivation in time-multiplexed deep dry etching of silicon.

AU - Blauw, MA

AU - Zijlstra, T

AU - van der Drift, EWJM

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 1071-1023

VL - 19

SP - 2930

EP - 2934

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -