Balancing the etching and passivation in time-multiplexed deep dry etching of silicon.

MA Blauw, T Zijlstra, EWJM van der Drift

Research output: Contribution to journalArticleScientificpeer-review

102 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2930-2934
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume19
Issue number6
Publication statusPublished - 2001

Keywords

  • ZX Int.klas.verslagjaar < 2002

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