Beam deflection device, aberration corrector, monochromator, and charged particle beam device

P. Kruit (Inventor)

ImPhys/Microscopy Instrumentation & Techniques

Research output: Patent

Original language	English
IPC	Ho1J37/147, Ho1j37/05, Ho1J37/153
Priority date	31/05/19
Publication status	Published - 2020

Bibliographical note

Patent: OCT-19-033
Applicant: Hitachi High-Technologies Corporation

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