Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride films

GCAM Janssen, RB Hoy

    Research output: Contribution to journalArticleScientificpeer-review

    10 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)569-571
    Number of pages3
    JournalJournal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
    Volume21
    Issue number3
    Publication statusPublished - 2003

    Keywords

    • ZX CWTS JFIS < 1.00

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