Birefringe induced by the spatial dispersion in deep UV Lithography: Theory and advanced compensation strategy.

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Keywords

@article{872befab64d646e98c34d9a7d9d461b3,

title = "Birefringe induced by the spatial dispersion in deep UV Lithography: Theory and advanced compensation strategy.",

keywords = "ZX CWTS JFIS < 1.00",

author = "A Serebriakov and E. Maksimov and F Bociort and JJM Braat",

year = "2005",

language = "Undefined/Unknown",

volume = "12",

pages = "140--145",

journal = "Optical Review",

issn = "1340-6000",

publisher = "Springer",

}