Buried oxide and defects in oxygen implanted Si monitored by positron annihilation

AC Kruseman, A van Veen, H Schut, PE Mijnarends, M Fujinami

    Research output: Contribution to journalArticleScientificpeer-review

    17 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)1179-1187
    Number of pages9
    JournalJournal of Applied Physics
    Issue number90
    Publication statusPublished - 2001

    Keywords

    • ZX Int.klas.verslagjaar < 2002

    Cite this

    Kruseman, AC., van Veen, A., Schut, H., Mijnarends, PE., & Fujinami, M. (2001). Buried oxide and defects in oxygen implanted Si monitored by positron annihilation. Journal of Applied Physics, (90), 1179-1187.