Buried oxide and defects in oxygen implanted Si monitored by positron annihilation

AC Kruseman, A van Veen, H Schut, PE Mijnarends, M Fujinami

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{72f92c64667644a2b8c07926c3690c52,

title = "Buried oxide and defects in oxygen implanted Si monitored by positron annihilation",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "AC Kruseman and \{van Veen\}, A and H Schut and PE Mijnarends and M Fujinami",

year = "2001",

language = "Undefined/Unknown",

pages = "1179--1187",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "90",

}

TY - JOUR

T1 - Buried oxide and defects in oxygen implanted Si monitored by positron annihilation

AU - Kruseman, AC

AU - van Veen, A

AU - Schut, H

AU - Mijnarends, PE

AU - Fujinami, M

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

UR - https://www.scopus.com/pages/publications/0035425010

M3 - Article

SN - 0021-8979

SP - 1179

EP - 1187

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 90

ER -