Cathode Ray tube type electron gun as a source for multibeam electron lithography

AJ van den Brom, AHV van Veen,, WM Weeda, GZM Berglund, M.J.J. Wieland, P Kruit

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	2245-2249
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	25
Issue number	6
Publication status	Published - 2007

Keywords

@article{c8df9a6d07b84dc0a08777d0b6aab941,

title = "Cathode Ray tube type electron gun as a source for multibeam electron lithography",

keywords = "academic journal papers, CWTS 0.75 <= JFIS < 2.00",

author = "{van den Brom}, AJ and {van Veen,}, AHV and WM Weeda and GZM Berglund and M.J.J. Wieland and P Kruit",

year = "2007",

language = "Undefined/Unknown",

volume = "25",

pages = "2245--2249",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Cathode Ray tube type electron gun as a source for multibeam electron lithography

AU - van den Brom, AJ

AU - van Veen,, AHV

AU - Weeda, WM

AU - Berglund, GZM

AU - Wieland, M.J.J.

AU - Kruit, P

PY - 2007

Y1 - 2007

KW - academic journal papers

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 1071-1023

VL - 25

SP - 2245

EP - 2249

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -