Original language | Undefined/Unknown |
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Pages (from-to) | 281-286 |
Number of pages | 6 |
Journal | Microelectronics Reliability |
Volume | 38 |
Publication status | Published - 1998 |
Characteizatin of deposition rate and gap filling capability of a high density plasma deposition reactor
DJ de Boer, GCAM Janssen, S Radelaar
Research output: Contribution to journal › Article › Scientific › peer-review
5
Citations
(Scopus)