Characteizatin of deposition rate and gap filling capability of a high density plasma deposition reactor

DJ de Boer, GCAM Janssen, S Radelaar

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	281-286
Number of pages	6
Journal	Microelectronics Reliability
Volume	38
Publication status	Published - 1998

Cite this

@article{9093eb85473c4942b5aaf9ad79def71b,

title = "Characteizatin of deposition rate and gap filling capability of a high density plasma deposition reactor",

author = "{de Boer}, DJ and GCAM Janssen and S Radelaar",

year = "1998",

language = "Undefined/Unknown",

volume = "38",

pages = "281--286",

journal = "Microelectronics Reliability",

issn = "0026-2714",

publisher = "Elsevier",

}