Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

Y Huang, G Pandraud, PM Sarro

Research output: Contribution to journalArticleScientificpeer-review

48 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-8
Number of pages8
JournalJournal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Volume31
Issue number1
DOIs
Publication statusPublished - 2013

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