Charge-induced pattern displacement in E-beam lithography

Kerim T. Arat, Thomas Klimpel, Aernout C. Zonnevylle, Wilhelmus S.M.M. Ketelaars, Carel Th H. Heerkens, Cornelis W. Hagen

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)
    27 Downloads (Pure)


    Dive into the research topics of 'Charge-induced pattern displacement in E-beam lithography'. Together they form a unique fingerprint.

    Engineering & Materials Science

    Chemical Compounds

    Physics & Astronomy