| Original language | English |
|---|---|
| Patent number | US 7,084,414 |
| IPC | aanvrager: Mapper Lithography IP B.V. |
| Priority date | 1/08/06 |
| Publication status | Published - 2006 |
Bibliographical note
aanvrager: Mapper Lithography IP B.V.Keywords
- other publications
- Octrooi
Charged particle beamlet exposure system
M.J.J. Wieland (Inventor), P Kruit (Inventor)
Research output: Patent