Charged particle lithography system with aperture array cooling

P. Kruit (Inventor), A.H. van Veen (Inventor)

Research output: Patent

Original languageEnglish
Patent numberUS 8558196 B2
IPCH01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B
Priority date26/10/10
Publication statusPublished - 2013

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