Charged particle lithography system with aperture array cooling

P. Kruit; A.H. van Veen

Charged particle lithography system with aperture array cooling

P. Kruit (Inventor), A.H. van Veen (Inventor)

ImPhys/Microscopy Instrumentation & Techniques

Research output: Patent

Original language	English
Patent number	US 8558196 B2
IPC	H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B
Priority date	26/10/10
Publication status	Published - 2013

Bibliographical note

Patent: onknown
Applicant: MAPPER Lithography B.V.

1 Patent

Modulation device and charged particle multi-beamlet lithography system using the same
Kruit, P. & van Veen, A. H., 2012, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Priority date 26 Oct 2010, Priority No. WO 2012055938 A1
Research output: Patent

Cite this

@misc{8af863684cd64f3f9dc9e9c6ed9f0ddc,

title = "Charged particle lithography system with aperture array cooling",

author = "P. Kruit and {van Veen}, A.H.",

note = "Patent: onknown Applicant: MAPPER Lithography B.V.; US 8558196 B2; H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B",

year = "2013",

language = "English",

type = "Patent",

}

Charged particle lithography system with aperture array cooling

Bibliographical note

Research output

Modulation device and charged particle multi-beamlet lithography system using the same

Cite this