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Charged particle lithography system with aperture array cooling
P. Kruit
(Inventor), A.H. van Veen (Inventor)
ImPhys/Microscopy Instrumentation & Techniques
Research output
:
Patent
Overview
Research output
(1)
Research output
Research output per year
2012
2012
2012
1
Patent
Research output per year
Research output per year
1 results
Title
(descending)
Publication Year, Title
Title
(ascending)
Type
Search results
Modulation device and charged particle multi-beamlet lithography system using the same
Kruit, P.
&
van Veen, A. H.
,
2012
, IPC No. H01L, H04Q, G02B, B82Y, B32B, B29C, G03F, H01J, G03B, B01J, G21K, G06F, G01B, Priority date
26 Oct 2010
, Priority No. WO 2012055938 A1
Research output
:
Patent