| Original language | English |
|---|---|
| Patent number | US61/491865 |
| IPC | Aanvrager: MAPPER Lithography B.V. |
| Priority date | 31/05/11 |
| Publication status | Published - 2011 |
Bibliographical note
Aanvrager: MAPPER Lithography B.V.Keywords
- Octrooi
Charged particle multi-beamlet apparatus
P Kruit (Inventor), CA Zonnevylle (Inventor)
Research output: Patent