Chemical vapor deposition of alpha-boron layers on silicon for controlled nanometer deep p+n junction formation

F Sarubbi, TLM Scholtes, LK Nanver

Research output: Contribution to journalArticleScientificpeer-review

70 Citations (Scopus)
Original languageEnglish
Pages (from-to)162-173
Number of pages12
JournalJournal of Electronic Materials
Volume39
Issue number2
DOIs
Publication statusPublished - 2009

Bibliographical note

NEO

Keywords

  • CWTS JFIS < 0.75

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